ÕV INTERNATIONAL CONFERENCE ON PHYSICS AND TECHNOLOGY OF THIN FILMS AND NANOSYSTEMS
Ivanî-Frankivsk, May, 11-16, 2015, page 262
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ÕV INTERNATIONAL CONFERENCE ON PHYSICS AND TECHNOLOGY OF THIN FILMS AND NANOSYSTEMSIvanî-Frankivsk, May, 11-16, 2015, page 262 |
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High Temperature Oxidation of Nickel Silicides Films Formed from Thin Ni FilmsDranenko A.S., Koshelev M.V.
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